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Boron tribromide(BBr3), 99.9%
【Chemical Name】Boron tribromide
【Synonym】BBr3；Boron Tribromide
【CAS No】10294-33-4
【Molecular Formula】BBr3
【Molecular Weight】250.52
【Properties】 Melting point −46 °C(lit.) Boiling point ~90 °C (rough estimate) Density 8.6 (vs air) (rough estimate) Vapor pressure 5.33kPa（14℃) Refractive index 1.4340
【Packing】50kg/drum; 100kg/drum
【Usage】
Boron tribromide is used in the semiconductor industry, including integrated circuits, solar cells, semiconductor separation devices, etc., as a P-type doping source, P-type doping of crystalline silicon through thermal diffusion.
Secondly, boron tribromide is also used as catalysts, intermediates and brominators for organic synthesis, as well as raw materials for the manufacture of high purity boron and other organoborides. In organic synthesis, it is used as the dehydroxylation protection of methyl ether in aromatic ring to generate phenolic hydroxyl group.
【Introduction】
Selection of raw materials: With years of accumulation in the field of boron fine chemical production and preparation, our cooperative factory has a complete production quality management system, strict control of raw materials for product production, and selected high-quality raw material suppliers.
Mature and controllable process: Our factory boron tribromide production process is mature and controllable, coupled with complete product testing methods and means, product quality is stable and reliable.
Rapid and effective supply service: localization, legal, safe production and advanced marketing, logistics management ability of a good combination, to provide customers with timely, safe and thoughtful supply service.
Boron tribromide(BBr3), 99.9%
【Chemical Name】Boron tribromide
【Synonym】BBr3；Boron Tribromide
【CAS No】10294-33-4
【Molecular Formula】BBr3
【Molecular Weight】250.52
【Properties】 Melting point −46 °C(lit.) Boiling point ~90 °C (rough estimate) Density 8.6 (vs air) (rough estimate) Vapor pressure 5.33kPa（14℃) Refractive index 1.4340
【Packing】50kg/drum; 100kg/drum
【Usage】
Boron tribromide is used in the semiconductor industry, including integrated circuits, solar cells, semiconductor separation devices, etc., as a P-type doping source, P-type doping of crystalline silicon through thermal diffusion.
Secondly, boron tribromide is also used as catalysts, intermediates and brominators for organic synthesis, as well as raw materials for the manufacture of high purity boron and other organoborides. In organic synthesis, it is used as the dehydroxylation protection of methyl ether in aromatic ring to generate phenolic hydroxyl group.
【Introduction】
Selection of raw materials: With years of accumulation in the field of boron fine chemical production and preparation, our cooperative factory has a complete production quality management system, strict control of raw materials for product production, and selected high-quality raw material suppliers.
Mature and controllable process: Our factory boron tribromide production process is mature and controllable, coupled with complete product testing methods and means, product quality is stable and reliable.
Rapid and effective supply service: localization, legal, safe production and advanced marketing, logistics management ability of a good combination, to provide customers with timely, safe and thoughtful supply service.
